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Device dimensions: 1700W × 1300D × 1400H
Set the substrate manually in the chuck, then perform paddle development, rinsing, and spin drying. A canister can be stored on the side of the main unit.
Spin coating device
The process from developing the resist film applied on the glass substrate while rotating it to rinsing with pure water is performed automatically. 【Features】 ● A developing solution purge mechanism is provided, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The nozzle movement can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For details, please request the materials.
